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A comprehensive analysis of nanoscale single- and multi-gate MOSFETs

Sharma Rupendra Kumar, Dimitriadis Charalabos A., Bucher Matthias

Απλή Εγγραφή


URIhttp://purl.tuc.gr/dl/dias/52BED836-8BC8-476D-BB33-D94EA624EDD9-
Αναγνωριστικόhttps://www.sciencedirect.com/science/article/pii/S0026269216000550?via%3Dihub-
Αναγνωριστικόhttps://doi.org/10.1016/j.mejo.2016.03.004-
Γλώσσαen-
Μέγεθος7 pagesen
ΤίτλοςA comprehensive analysis of nanoscale single- and multi-gate MOSFETsen
ΔημιουργόςSharma Rupendra Kumaren
ΔημιουργόςDimitriadis Charalabos A.en
ΔημιουργόςBucher Matthiasen
ΔημιουργόςBucher Matthiasel
ΕκδότηςElsevieren
ΠερίληψηAnalog/RF performance of nanoscale triple gate FinFETs and planar single-gate (SG) and double-gate (DG) SOI MOSFETs is examined via extensive 3D device simulations. Well-designed DG MOSFETs attain higher values of cut-off frequency for both lower and higher drain currents, whereas triple-gate (TG) FinFETs offer higher intrinsic gain while compromising cut-off frequency. For longer channel lengths, SG MOSFETs show slightly higher cut-off frequency in comparison to multi-gate (MG) MOSFETs, whereas MG MOSFETs exhibit higher cut-off frequency for lower channel lengths. A unique figure of merit, gain transconductance frequency product (GTFP) for best trade-off among gain, transconductance, and speed is compared. Double-gate MOSFETs exhibit higher GTFP over a wide range of device scaling, thus remain a good candidate for analog/RF applications. Furthermore, the RF linearity performance of these devices has been examined.en
ΤύποςPeer-Reviewed Journal Publicationen
ΤύποςΔημοσίευση σε Περιοδικό με Κριτέςel
Άδεια Χρήσηςhttp://creativecommons.org/licenses/by/4.0/en
Ημερομηνία2018-10-12-
Ημερομηνία Δημοσίευσης2016-
Θεματική ΚατηγορίαAnalog/RF performanceen
Θεματική ΚατηγορίαATLAS device simulatoren
Θεματική ΚατηγορίαLinearityen
Θεματική ΚατηγορίαMulti-gate MOSFETsen
Βιβλιογραφική ΑναφοράR. K. Sharma, C. A. Dimitriadis and M. Bucher, "A comprehensive analysis of nanoscale single- and multi-gate MOSFETs," Microelectr. J., vol. 52, pp. 66-72, Jun. 2016. doi: 10.1016/j.mejo.2016.03.004en

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